High-k Materials in Multi-Gate FET Devices

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High-k Materials in Multi-Gate FET Devices

  • 著者名:Tayal, Shubham (EDT)/Singla, Parveen (EDT)/Davim, J. Paulo (EDT)
  • 価格 ¥16,889 (本体¥15,354)
  • CRC Press(2021/09/16発売)
  • 春うらら!Kinoppy 電子書籍・電子洋書 全点ポイント30倍キャンペーン(~3/15)
  • ポイント 4,590pt (実際に付与されるポイントはご注文内容確認画面でご確認下さい)
  • 言語:ENG
  • ISBN:9780367639693
  • eISBN:9781000438819

ファイル: /

Description

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level.

  • Provides basic knowledge about FET devices
  • Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies
  • Discusses fabrication and characterization of high-k materials
  • Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures
  • Offers detailed application of high-k materials for advanced FET devices
  • Considers future research directions

This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.

Table of Contents

Chapter 1 Introduction to Multi-Gate FET Devices

Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for

Advance Semiconductor Devices: An Overview

Chapter 3 Influence of High-k Material in Gate Engineering and in

Multi-Gate Field Effect Transistor Devices

Chapter 4 Trap Charges in High-k and Stacked Dielectric

Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain

Leakage of Multi-Gate FETs

Chapter 6 Advanced FET Design Using High-k Gate Dielectric and

Characterization for Low-Power VLSI

Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with

Application of High-k Dielectric Using Visual TCAD

Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET

with High-k Dielectric for Biomolecule Detection

Chapter 9 Asymmetric Junctionless Transistor: A SRAM

Performance Study

Chapter 10 Performability Analysis of High-k Dielectric-Based

Advanced MOSFET in Lower Technology Nodes

Index

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