Ion Formation from Organic Solids (Ifos IV : Mass Spectrometry of Involatile Material : Proceedings of the Fourth International Conference, Munster,)

Ion Formation from Organic Solids (Ifos IV : Mass Spectrometry of Involatile Material : Proceedings of the Fourth International Conference, Munster,)

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  • 製本 Hardcover:ハードカバー版
  • 言語 ENG,ENG
  • 商品コード 9780471924852
  • DDC分類 539.60287

Full Description

Fundamental aspects, instrumentation and analytical applications are considered in this 4th international conference on ion formation from organic solids (IFOS IV), concentrating on the developing of desorbed neutral particles. Theoretical aspects are discussed as well as analytical applications of the different techniques applied for the ionization organic materials and the different techniques available for the identification of desorbed neutral particles are also looked into.


Part 1 Ion desorption by keV-particle bombardment: experiments on secondary ion emission with multicharged keV ion bombarddment; some remarks concerning peptide sequencing with soft ionisation methods, W.Kausler et al; damage processes in molecular ion sputtering from solid and liquid targets, P.Williams; quantification of negative time-of-flight secondary ion mass spectra of poly(alkylmethacrylate) surfaces, J.Lub and P.N.T.van Velzen; SIMS of acrylic polymers - a detailed study of ion formation from thick films, D.Briggs and M.J.Hearn; ion formation from solid cometary matter by dust particle impact, laser excitation and SIMS, F.R.Krueger and J.Kissel. Part 2 Ion desorption by meV-particle bombardment: on the upper mass limit of secondary ions ejected in electronic sputtering from organic solids, B.U.R.Sundqvist et al; secondary ion emission from epitaxal fluoride crystals irradiated by MeV Beams; the use of immoblized surfactant films as a matrix for enhances secondary ion yields in 252Cf-plasma desorption mass spectrometry; influence of substrate on kinetic energy distributions in 252Cf-plasma desorption mass spectrometry, R.d.Macfarlane and D.L.Jacobs; unimolecular decay measurements with an ion mirror, K.G.standing et al; sensitivity as function of the samplee preparation technique in plasma desorption mass spectrometry, P.F.Nielson and P.Roepstorff; conclusions from matrix effects and correlations of secondary ions in 252Cf-PDMS, L.Schmidt and H.Jungclas; computer simulations of FHIID, E.R.Hilf et al. Part 3 Ion sdesorption by laser irradiation: photochemical reaction pathways and their relevance to ultraviolet laser desorption mass spectra, M.Karas and F.Hillenkamp; on the influence of laser induced mechanical stress in organic sample layers on the ion formation, B.Lindner and U.Seydel; FTMS of organic secondary ions, P.Grossmann and H.P.Kellerhals. Part 4 Postionization of neutrals: surface analysis of bulk polymers by postionization with VUV laser light, U.Schuhle et al; laser desorption - photodissociation FTMS, L.M.Nuwaysir and C.L.Wikins; ion investigation by multiphoton ionization and laser desorption fragmentation and sequencing of peptides; multiphotonionization (MPI) mass spectrometry of laserdesorbed molecules, U.Bahr et al; studies of sputtered ions in a high-pressure fast-atom bombardment source, M.M.Ross and J.H.Callahan; SIMS/SNMS of small organic molecules, M.Kempken et al.