Description
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.- Comprehensive coverage of innovations in surface contamination and cleaning- Written by established experts in the contamination and cleaning field- Each chapter is a comprehensive review of the state of the art- Case studies included
Table of Contents
- Surface Contamination Removal Using Dense Phase Fluids: Liquid and Supercritical Carbon Dioxide- Plasma Cleaning for Electronic, Photonic, Biological and Archeological Applications- Cleanroom Wipers for Removal of Surface Contamination- Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing- Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale
