Particle Beams and Plasma Interaction on Materials and Ion and Plasma Surface Finishing (Solid State Phenomena) 〈Vol. 107〉

Particle Beams and Plasma Interaction on Materials and Ion and Plasma Surface Finishing (Solid State Phenomena) 〈Vol. 107〉

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  • 製本 Paperback:紙装版/ペーパーバック版/ページ数 150 p.
  • 言語 ENG
  • 商品コード 9783908451129
  • DDC分類 620

Full Description

Volume is indexed by Thomson Reuters CPCI-S (WoS).
This collection presents, and analyses, the new ideas in the emerging technologies involved in the production and use of particle beams and plasmas.

Contents

X-Rays at the SIAM Photon Source
Study of Multicellular Living Organisms by SXCM (Soft X-Ray Contact Microscopy)
Radiation Production Using Femtosecond Electron Bunches
Femtosecond Electron Pulses Production System
A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System
The Progress of Ion Beam Bioengineering in China
Plasma-Based Ion Implantation Treatments under Industrially Relevant Conditions
The Progress of the Research and Application of Ion Implantation Biotechnology in China
Formation of Aluminum Nitride Film for High Power Soft X-Ray Source Using Ion-Beam Assisted Deposition Method
Development of In Situ Atomic Force Microscopy for Study of Ion Beam Interaction with Biological Cell Surface
Ion Beam Synthesis of Silicon Carbide
Search for Enhanced D+D+D Reactions under D+ Beam Irradiation into TiDx Targets
Bunch Compression of a Non-Relativistic 280-keV-He+ Beam
Vacuum Arc Plasma Guns and Ion Sources
Seeing Inside a Hot Plasma: Photoionization of Ions
DLC-Film Schottky Barrier Diodes
Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges
Inactivation and Destruction of Bacillus Subtilis Using a Low Pressure Glow Discharge Plasma
Efficiency of Energy Transfer in a Small Plasma Focus Device
Sterilization Performance of Ultraviolet Emission from Laser Plasmas
Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 - ICPCVD
Ion Beam Modification of Carbon Materials
Anti-Corrosion Properties of Nitrogen and Oxygen Plasma-Implanted Nickel-Titanium Shape Memory Alloy
Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion
Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing
Plasma Treatment of Silk
Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel
Tribological Improvement of Thermal-Sprayed Ti-Based Coatings Modified by 1200 K Nitridation
Thermal Stability of Nanoscale Multilayered ZrAlN/ZrB2 Coatings
Improve Stability of Dicalcium Silicate/Zirconia Composite Coatings by Post-Spraying Heat Treatment
Deposition of TiC on γ-TiAl Alloys by Directly Applying Voltages
Generation of Deuteron Beam from the Plasma Focus

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