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Full Description
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
Contents
Preface
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems
