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Full Description
The tremendous growth and development in modern information and communication technology have been made possible due to the rapid advances in the fields of microelectronics and photonics. The area of microelectronics deals with the study and development of semiconductor-based electronic components and circuits of very small size starting from the micrometer to nanometer scale. This book examines and presents recent developments in the semiconductor devices for future generation microelectronics and photonics technologies. It includes some advanced CMOS device structures for future generation nanoscale IC technology, microdevices for pressure sensors, source and detectors for photonic applications and lithography process for nanoscale fabrication.
Contents
Preface; Trench Gate Power MOSFETNanocrystal Floating Gate Memory Devices; Double-Gate (DG) MOSFETs: A Review; Effect of Independent Gate, Asymmetric & Gate-S/D Underlap Features on Nano Scale Subthreshold Double Gate MOSFET Performance; Full Band Models for Strained Silicon & Germanium Devices; High Performance Ge MOSFETs for Future Nanoelectron; Advances in Pressure Sensors; Transistor LASER: Principle, Analytical Models & Applications; Advances in Semiconductor Photodetectors for Infrared Applications; Process Monitoring for Nano-Imprint Lithography; Index.NER(01): GB IE
