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Full Description
This book provides a comprehensive and updated 'state-of-the-art' compilation on nanolithography and implications on future nanometer IC designs. Its scope in a bottom-up manner, includes the underlying equipment and process issues for nanolithography, the computational lithography aspects, and the key design and CAD issues and possible solutions. The subjects covered include: introduction of nanolithography process and trends; computational lithography (including lithography simulations, OPC, inverse lithography, pixilated mask, source mask optimization, etc.); lithography-aware analysis & design; and, future lithography technologies and EDA impact.
Contents
Optical Lithography Process and Trends.- Computational Lithography.- Litho-aware Analysis and Design.- Future Lithography Technologies and EDA Impact.