- ホーム
- > 洋書
- > 英文書
- > Science / Mathematics
Full Description
Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods.
Discusses thin film growth, structure, and properties
Covers fractal theory
Presents methods of fractal measurements
Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes
Describes application of fractal theory in prediction of thin film growth and properties
This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Contents
Part 1. Theory. 1. Thin Film Growth, Structure, and Properties. 2. Fractal Theory. 3. Methods of Fractal Measurements. Part 2. Typical Studies of Fractal Descriptions of Sputtered Films. 4. Fractal Characterization of Hillocks and Porosity in Sputtered Films. 5. Fractal Analyses of Roughness of Sputtered Films. 6. Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films. 7. Fractal Prediction of Film Growth and Properties.
