Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses : Fundamental Mechanisms and Application to IC Interconnect Technology
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Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses : Fundamental Mechanisms and Application to IC Interconnect Technology  Paperback,  言語:ENG

Borst, Christopher Lyle/ Gill, William N./ Gutmann, Ronald J.

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  • Springer-Verlag New York Inc.(2014/02発売)
  • ポイント 1,685pt
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