Nanoimprint Lithography : An Enabling Process for Nanofabrication

Zhou, W.

Springer（2012/12発売）

• 製本 Hardcover:ハードカバー版／ページ数 288 p.／サイズ 212 illus.
• 商品コード 9783642344275

基本説明

Provides consistent multi-disciplinary approach demonstrating principles of the field including latest achievements in hot areas such as nanofabrication and nanotechnology.

Full Description

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Contents

Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.