Ion Implantation and Annealing Applications, Science and Technology : Contributions from IIT School, Edition 2024 (Topics in Applied Physics)

Lerch, Wilfried (EDT)/ Current, Michael (EDT)

Springer Nature Switzerland AG（2026/01発売）

• 製本 Hardcover:ハードカバー版
• 言語 ENG
• 商品コード 9783032100078

Full Description

This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.

Contents

Chapter 1: History of Integrated Circuits and Ion Implantation.- Chapter 2: Common Applications of Ion Implantation in CMOS Process Technology.- Chapter 3:          Commercial Ion Implantation Systems.- Chapter 4: Ion Sources.- Chapter 5: Radiation Damage of Silicon.- Chapter 6: Annealing of Radiation Damage in Silicon and Silicon.-Chapter 7: New Advancement in Ion Implantation Annealing for Si, Ge, SiC and GaN.- Chapter 8: Cluster Ion Beam: History and Technology.- Chapter 9: Ion Transport and Implant Control.- Chapter 10: Ion Beam Purity and Wafer Contamination.- Chapter 11: Safety Considerations for Ion Implanters.- Chapter 12: Power Devices and New Base Materials.- Chapter 13: Special Applications of Ion Implantation in CMOS Process Technology.