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基本説明
Details the most important techniques used in industrial applications, providing coverage from the basic physics to the technical details of each, with emphasis on the macroscopic engineering of the processes and the microscopic characterization of the produced coatings.
Full Description
Vapor Surface Treatments
There are many different vapor phase surface treatments of materials that can be used to produce a wide variety of end results, but each of them are of increasing importance in the pursuit of high performance advanced materials. These techniques differ significantly in the physical or chemical nature of the gas-surface interactions involved, and also in the thickness and morphology of the coatings produced.
Applications include advanced semiconductors, optics, and nanotechnology, as well as many more. This book details the most important techniques used in industrial applications, providing coverage from the basic physics to the technical details of each, with emphasis on the macroscopic engineering of the processes and the microscopic characterization of the produced coatings.
Vacuum evaporation, cathodic sputtering and ion implantation produce thin films mainly by physical interactions; gas cementation, nitridation, carbonitridation and pack cementation produce thicker surface modifications involving chemical reactions. A section of the book is devoted to chemical vapor deposition (CVD) processes, with dedicated chapters dealing with i) principles and industrial applications, ii) the use of plasma and lasers to assist deposition, and iii) macroscopic modeling of reactors. Alain Galerie has drawn contributions from leading experts at top research universities to produce a complete overview of the vapor phase surface treatments which have an increasing role in modern surface engineering.
Contents
Chapter 1. Vacuum Evaporation. 1
Aimé RICHARDT and Isabelle RICHARDT
Chapter 2. Cathode Sputtering. 53
Yves PAULEAU
Chapter 3. Ion Implantation and Ion Beam Assisted Deposition 93
Jean-Paul RIVIÈRE
Chapter 4. Chemical Vapor Deposition: Principles and Applications. 139
Elisabeth BLANQUET and Frédéric SCHUSTER
Chapter 5. Laser or Plasma Assisted Chemical Vapor Deposition. 163
Jean DESMAISON, Christelle TIXIER and Pascal TRISTANT
Chapter 6. Coupled Phenomena Modeling in CVD. 199
Michel PONS and Francis BAILLET
Chapter 7. Gas Phase Carburation and Carbonitriding of Steels 251
Jacky DULCY and Michel GANTOIS
Chapter 8. Ion Nitriding and Afterglow Treatments. 303
Thierry BELMONTE, Thierry CZERWIEC and Henri MICHEL
Chapter 9. Pack Cementation. 361
Alain GALERIE and Yves WOUTERS
List of authors 385
Index 389
