Ion Impantation Technology : 16th International Conference on Ion Implantation Technology; IIT 2006 (Aip Conference Proceedings: Accelerators, Beams, and Instrumentations)

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Ion Impantation Technology : 16th International Conference on Ion Implantation Technology; IIT 2006 (Aip Conference Proceedings: Accelerators, Beams, and Instrumentations)

Kirkby, Karen J. (EDT)/ Gwilliam, Russell M. (EDT)/ Smith, Andy (EDT)

American Institute of Physics（2006/12発売）

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製本 Hardcover:ハードカバー版／ページ数 682 p.
言語 ENG
商品コード 9780735403659
DDC分類 621.38152

Full Description

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.