集束イオンビーム装置 Focused Ion Beam Systems : Basics and Applications

集束イオンビーム装置<br>Focused Ion Beam Systems : Basics and Applications

個数：

集束イオンビーム装置
Focused Ion Beam Systems : Basics and Applications

Yao, Nan (EDT)

ウェブストア価格 ¥15,002（本体¥13,639）
Cambridge University Press（2011/04発売）
外貨定価 US$ 74.00
ポイント 136pt

提携先の海外書籍取次会社に在庫がございます。通常3週間で発送いたします。
【重要ご説明事項】
1. 納期遅延や、ご入手不能となる場合が若干ございます。
2. 複数冊ご注文の場合、分割発送となる場合がございます。
3. 美品のご指定は承りかねます。

●3Dセキュア導入とクレジットカードによるお支払いについて

【入荷遅延について】
世界情勢の影響により、海外からお取り寄せとなる洋書・洋古書の入荷が、表示している標準的な納期よりも遅延する場合がございます。
おそれいりますが、あらかじめご了承くださいますようお願い申し上げます。

◆画像の表紙や帯等は実物とは異なる場合があります。

◆ウェブストアでの洋書販売価格は、弊社店舗等での販売価格とは異なります。
また、洋書販売価格は、ご注文確定時点での日本円価格となります。
ご注文確定後に、同じ洋書の販売価格が変動しても、それは反映されません。

製本 Paperback:紙装版/ペーパーバック版／ページ数 408 p.
言語 ENG
商品コード 9780521158596
DDC分類 621.38152

基本説明

New in paperback. Hardcover was published in 2007. Covers the state-of-the-art in focused ion beam and two beam technology. Self-contained and conprehensive working knowledge of the full range of focused ion beam and two beam technology, including state-of-the-art developments in the field.

Full Description

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito; Index.