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Full Description
This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and atmospheric science.
Contents
UV spectroscopy in chemical physics, combustion, plasma science, and photolithography: ultraviolet and vacuum ultraviolet source and materials for lithography. Laser optogalvanic spectroscopy for discharge plasmas in the ultraviolet region. Spectra of the isotopomers of CO, N2, and NO in the ultraviolet. Photoabsorpton cross section measurements in the UV and VUV. UV and VUV laser spectroscopy using florescence. Time-of-flight mass detection. VUV spectroscopy of diatomic and triatomic molecules and VUV optical photolithography. Spectroscopy associated with the search for new UV and VUV solid-state materials for laser technology: tunable solid-state UV and VUV lasers. VUV laser spectroscopy of trivalent rare earth ions in wide band-gap fluoride crystals. Spectroscopy of broadband UV emitting materials based on trivalent rare earth ions. Solid-state tunable lasers for UV applications: generation of coherent ultraviolet and vacuum ultraviolet radiation by nonlinear processes in intense optical fields. All-solid-state, short-pulse, tunable, ultraviolet laser sources based on Ce3-activated by fluoride crystals. Diode-pumped picosecond UV lasers by nonlinear frequency conversions. UV spectroscopy in atmospheric science and astronomy: atmospheric ultraviolet spectroscopy. Ultraviolet spectroscopy in astronomy.
