Modern Ion Plating Technology : Fundamentals and Applications

Wang, Fuzhen/ Wu, Junwei

Elsevier - Health Sciences Division（2022/09発売）

• 製本 Paperback:紙装版/ペーパーバック版／ページ数 550 p.
• 言語 ENG
• 商品コード 9780323908337
• DDC分類 667.9

Full Description

Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems.

Contents

1. Introduction of Ion Plating Technology
2. Fundamental of Vacuum Physics
3. Fundamental of Plasma Physics
4. Classification of Vacuum Plating Technology
5. Vacuum Evaporation Plating
6. Glow discharge Ion plating
7. 7 Hot Arc Ion Plating
8. Cathodic Arc Ion Plating
9. Magnetron Sputtering Technology
10. Plasma chemical vapor deposition (CVD)
11. Function of Charged Particle Beams in Plating
12. Application of Ion Plating