Developments in Surface Contamination and Cleaning, Vol. 1 : Fundamentals and Applied Aspects （2ND）

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Developments in Surface Contamination and Cleaning, Vol. 1 : Fundamentals and Applied Aspects （2ND）

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  • 製本 Hardcover:ハードカバー版／ページ数 894 p.
  • 言語 ENG
  • 商品コード 9780323299602
  • DDC分類 620.44

Full Description

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation.

Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination.

In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants.

The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Contents

Part 1 Fundamentals
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour 
2. Transport and Deposition of Aerosol Particles 
3. Relevance of Particle Transport in Surface Deposition and Cleaning 
4. Aspects of Particle Adhesion and Removal 
5. Tribological Implications of Particles 
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition 
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries

Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification 
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles 
10. Wettability Techniques to Monitor the Cleanliness of Surfaces 

Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning 
13. The Use of Surfactants to Enhance Particle Removal from Surfaces 
14. Microabrasive Precision Cleaning and Processing Technology 
15. Cleaning Using High-Speed Impinging Jet 
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols 
18. Coatings for Preventing or Deactivation of Biological Contaminants 
19. A Detailed Study of Semiconductor Wafer Drying 

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