薄膜析出ハンドブック（第４版） Handbook of Thin Film Deposition （4TH）

Seshan, Krishna (EDT)/ Schepis, Dominic (EDT)

William Andrew Publishing（2018/02発売）

• 製本 Paperback:紙装版/ペーパーバック版／ページ数 470 p.
• 言語 ENG
• 商品コード 9780128123119
• DDC分類 621.38152

Full Description

Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability.

Contents

Section 1 - SCALING
1. A Perspective on Today's Scaling Challenges and Possible Future Direction
2. Limits and Hurdles To Continued Cmos Scaling
3. Reliability Issues: Reliability Imposed Limits to Scaling
4. Thermal Engineering at the Limits of the CMOS Era

Section 2 - THIN FILM DEPOSITION EQUIPMENT AND PROCESSING
5. Limits Of Gate Dielectrics Scaling
6. Process Technology for Copper Interconnects
7. Sputter Processing
8. Thin Film Deposition for Front End of Line: The Effect of the Semiconductor Scaling, Strain Engineering and Pattern Effects
9. Equipment in CVD Processing
10. CMP Method and Practice
11. Atomic Layer Deposition: Fundamentals, Practice and Challenges
12. Optical Thin Films
13. Semiconductor Memory