薄膜の材料科学（第３版） Materials Science of Thin Films : Deposition and Structure （3TH）

薄膜の材料科学（第３版）<br>Materials Science of Thin Films : Deposition and Structure （3TH）

薄膜の材料科学（第３版）
Materials Science of Thin Films : Deposition and Structure （3TH）

Ohring, Milton/ Gall, Daniel

Academic Pr（2015/11発売）

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製本 Hardcover:ハードカバー版／ページ数 864 p.
言語 ENG
商品コード 9780123756664
DDC分類 620

基本説明

The long-awaited 3e of the leading textbook on thin film science. Includes fully updated figures, many new examples and end-of-chapter problems.

Full Description

Materials Science of Thin Filmscarries on the tradition of this intriguing series, offering the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. The authors' engaging style brings new coverage to a variety of important topics within the field, including the latest, and most important, deposition techniques, atomic layer deposition and high impulse magnetron sputtering, and new, or expanded, coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth.

A Historical PerspectiveIntroduction to Thin Films1. A Review of Materials Science 2. Vacuum Science and Technology 3. Thin-Film Evaporation Processes 4. Discharges, Plasmas, and Ion-Surface Interactions 5. Plasma and Ion Beam Processing of Thin Films 6. Chemical Vapor Deposition7. Substrate Surfaces and Thin-Film Nucleation 8. Epitaxy 9. Film Structure 10. Characterization of Thin Films and Surfaces 11. Interdiffusion, Reactions, and Transformations in Thin Films 12. Mechanical Properties of Thin Films