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基本説明
Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EUV optics, defect control, resist, mask techniques, and more.
Full Description
Publisher's Noteguaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.Master Extreme Ultraviolet Lithography TechniquesProduce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership. Design EUVL-ready photomasks, resist layers, and source-collector modulesAssemble optical components, mirrors, microsteppers, and scannersHarness laser-produced and discharge pulse plasma sourcesEnhance resolution using proximity correction and phase-shift Generate modified illumination using holographic elementsMeasure critical dimensions using metrology and scatterometry Deploy stable Mo/Si coatings and high-sensitivity multilayersHandle mask defects, layer imperfections, and thermal instabilities
Contents
PrefaceChapter 1. Wigner Distribution in OpticsChapter 2. Ambiguity Function in Optical EngineeringChapter 3. Rotations in Phase SpaceChapter 4. The Radon-Wigner Transform in Analysis, Design, and Processing of Optical SignalsChapter 5. Imaging Systems: Phase-Space RepresentationsChapter 6. Super Resolved Imaging in Wigner-Based Phase SpaceChapter 7. Radiometry, Wave Optics, and Spatial CoherenceChapter 8. Rays and WavesChapter 9. Self-Imaging in Phase SpaceChapter 10. Sampling and Phase SpaceChapter 11. Phase Space in Ultrafast OpticsIndexNER(01): WOW
