光学ポリマー<br>Photopolymers : Photoresist Materials, Processes, and Applications

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光学ポリマー
Photopolymers : Photoresist Materials, Processes, and Applications

  • 著者名:Nakamura, Kenichiro
  • 価格 ¥40,360 (本体¥36,691)
  • CRC Press(2018/09/03発売)
  • ポイント 366pt (実際に付与されるポイントはご注文内容確認画面でご確認下さい)
  • 言語:ENG
  • ISBN:9781466517288
  • eISBN:9781351832229

ファイル: /

Description

Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more.

Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

Table of Contents

Introduction

About the Author

Basic Idea of Photopolymerization

Introduction

Radical Polymerization

Monomers for Photopolymerization

Initiators of Photopolymerization

Inhibition of Polymerization

Cationic Photopolymerization

Photocrosslinking

Scission of Polymers

References

Chemically Amplified Resists

Introduction

Chemical Amplification of Photopolymers

Polymers for Chemical Amplification

Photoacid Generator

References

Process of Chemically Amplified Resists

Introduction

Progress of Resolution Limit

Immersion Lithography

Double Patterning

EUV Lithography

Direct Self-Assembly (DSA)

References

Nanoimprinting

Introduction

Thermal Nanoimprinting

UV Nanoimprinting

Cationic Polymerization of UV Nanoimprinting

Ene-Thiol Polymerization of UV Nanoimprinting

Soft Lithography

References

Industrial Applications of Photopolymers

Introduction

Application to Electronics

Optical Adhesive Polymers

Holographic Photopolymers

Application to Medical Materials

Microelectromechanical Systems (MEMS)

References